предварительный СПИСОК ПРИГЛАШЕННЫХ ДОКЛАДЧИКОВ

1. Colligon John, UK

Medical Applications of ion beams

2. Cristaudo Vanina, Belgium

Large argon clusters for organic and hybrid thin film analysis

3. Cupak Christian, Austria

Studying plasma-wall-interaction processes in the laboratory using a sensitive quartz crystal microbalance

4. Delcorte Arnaud, Belgium

New cluster ion beam-based approaches for (bio)surface tailoring and analysis

5. Djurabekova Flyura, Finland

Electron dynamics during swift heavy ion irradiation of grapheme

6. Du Guanghua, China

The Interdisciplinary Application of a GeV Single Ion Microbeam

7. Facsko Stefan, Germany

Nanopatterning of crystalline Ge (001) surfaces by ion irradiation at off-normal incidence

8. Grisolia Christian, France

Dust in tokamak and related safety open issues

9. Kalanov Dmitry, Germany

Ion beam sputter deposition of gallium oxide

10. Krasheninnikov Arkady, Germany

Radiation tolerance of two-dimensional materials and their behavior under ion beam irradiation

11. Krat Stepan, Russia

Deuterium trapping in co-deposited layers of ITER-relevant materials

12. Kucheyev Sergei, USA

Energetic condensation of ultra-thick films and coatings

13. Kuznetsov Andrej, Norway

Frenkel pairs versus secondary defects balance in ion irradiated semiconducting oxides

14. Linsmeier Christian, Germany

Influence of impurity species in deuterium plasmas and their mutual influence on the fuel retention in tungsten

15. Lorenz Katharina, Portugal

Radiation sensors based on GaN microwires

16. Mackova Anna, Czech Republic

Key role of ion beam technologies for application in microelectronics, optics and sensors

17. Michely Thomas, Germany

Ion beam induced magic vacancy cluster meshes in 2D materials

18. Niggas Anna, Austria

The interaction of highly charged ions with atomically thin materials

19. Nordlund Kai, Finland

Strong dependence of W sputtering on surface crystal orientation

20. Parodi Katia, Germany

Challenges and prospects of high precision ion beam therapy

21. Popov Vladimir, Russia

Quantum technologies based on the NV point defects created in diamond by implanted ions

22. Reiser Dirk, Germany

Data driven continuum models of surface dynamics - inference of atomistic parameters

23. Schleife André, USA

Pre-equilibrium effects and dynamic ionic charge in 2D materials under particle radiation

24. Sigmund Peter, Denmark

Stopping of slow ions revisited

25. Szabo Gabriel, Austria

Nanohillock formation on CaF₂ due to cluster-ion irradiation

26. Tripathi Ambuj, India

Ion beam induced modifications in carbon based 2D materials

27. Vinogradov Georgy, Russia

Modern etching technologies in nanoelectronics

28. Webb Roger, UK

New cluster ion beam-based approaches for (bio)surface tailoring and analysis

29. Wendler Elke, Germany

Radiation damage and thin film stress in ion implanted layers